Photoinitiator|Polyimide monomer|Low Dk material|Coating additive--Shanghai UVTECH Inc.

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Home
About Us
Products
Technology & Service
- Technology & Service
- Production Introduction
News
- Company news
- Industry news
Contact Us
语言
- 中文
- English
- 日本語

Products

Chloromethyl styrene
Benzocyclobutene
PPO & OPE
BMI

BMI

BMI-5100

CAS NO.:105391-33-1
2,2'-diallylbisphenol A

CAS NO.:1745-89-7
XDPO

CAS NO.:38661-56-2

Photoinitiator

Photoinitiator OXE-01
Photoinitiator OXE-02

Polyimide monomer

2,2'-Bis(trifluoromethyl)benzidine; TFMB
m-Tolidine
Hydrogenated PMDA
4-Phenylethynylphthalic Anhydride; 4-PEPA
Biphenyl-4,4'-dicarboxylic acid
4,4'-Oxybisbenzoic acid

Low Dk material

3-Chloromethyl styrene
4-Chloromethyl styrene
Chloromethyl styrene(mixture, meta+para）
1,2-Bis(4-vinylphenyl)ethane; BVPE

Coating additive

4-Bromobenzocyclobutene
4-Vinylbenzocyclobutene
DVS-BCB

Contact Us

Address: Shanyang Town, Jinshan District, Shanghai, 201508, China
Tel: +86 21 58330820;

Fax: +86 21 58330890
Email: sales@shuvtech.com

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