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- Photoinitiator 1173
- Photoinitiator 184
- Photoinitiator MPBZ
- Photoinitiator 784
- Photoinitiator 819
- Photoinitiator OXE-01
- Photoinitiator OXE-02
Photoinitiator
- 2,2'-Bis(trifluoromethyl)benzidine; TFMB
- m-Tolidine
- Hydrogenated PMDA
- 4-Phenylethynylphthalic Anhydride; 4-PEPA
- Biphenyl-4,4'-dicarboxylic acid
- 4,4'-Oxybisbenzoic acid
Polyimide monomer
- Tetramethyl Bisphenol A
- 2,2',3,3',5,5'-Hexamethylbiphenyl-4,4'-diol
- Vinylbenzyl chloride(para+ortho）
- 4-Vinylbenzyl chloride
- p,p'-Divinyl-1,2-diphenylethane; BVPE
- 2,2'-diallylbisphenol A
- N,N'-(4,4'-methylenediphenyl) dimaleimide
- MPPO
Low Dk material
- 1,2-Diaminocyclohexane
- 4,4'-methylenebis(N-sec-butylcyclohexanamine)
- Isobutyl 3,5-diamino-4-chloro benzoate
- TrimethyleneBis(4-aminobenzoate)
- Hydrogenated Bisphenol A
- Hydrogenated bisphenol A epoxy resin
- 5-Methyl-3-vinyl-2-oxazolidinone; VMOX
- 2,4,7,9-Tetramethyl-5-decyne-4,7-diol
Coating additive
Contact Us
Address: Shanyang Town, Jinshan District, Shanghai, 201508, China
Tel: +86 21 58330820;
Fax: +86 21 58330890
Email: sales@shuvtech.com
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