Home
About us
Products
Technology
- Technology & Service
- Production Introduction
News
- Company news
- Industry news
Contact Us
language
- 中
- 日本語

Home
About Us
Products
Technology & Service
- Technology & Service
- Production Introduction
News
- Company news
- Industry news
Contact Us
语言
- 中文
- English
- 日本語

Products

Low Dk material
Polyimide monomer
Photoinitiator
Monomer & Additives

Photoinitiator 784

Photoinitiator 784

CASNO.： 125051-32-3

Appearance：yellow to orange powder
Purity：98.0% min.

Last one：Photoinitiator MPBZ
BACK
Next one：Photoinitiator 819

Photoinitiator

Photoinitiator 1173
Photoinitiator 184
Photoinitiator MPBZ
Photoinitiator 784
Photoinitiator 819
Photoinitiator OXE-01
Photoinitiator OXE-02

Polyimide monomer

2,2'-Bis(trifluoromethyl)benzidine; TFMB
m-Tolidine
Hydrogenated PMDA
4-Phenylethynylphthalic Anhydride; 4-PEPA
Biphenyl-4,4'-dicarboxylic acid
4,4'-Oxybisbenzoic acid

Low Dk material

Tetramethyl Bisphenol A
2,2',3,3',5,5'-Hexamethylbiphenyl-4,4'-diol
Vinylbenzyl chloride(para+ortho）
4-Vinylbenzyl chloride
p,p'-Divinyl-1,2-diphenylethane; BVPE
2,2'-diallylbisphenol A
N,N'-(4,4'-methylenediphenyl) dimaleimide
Diphenyl(4-vinylphenyl)phosphane

Coating additive

1,2-Diaminocyclohexane
4,4'-methylenebis(N-sec-butylcyclohexanamine)
Isobutyl 3,5-diamino-4-chloro benzoate
TrimethyleneBis(4-aminobenzoate)
Hydrogenated Bisphenol A
Hydrogenated bisphenol A epoxy resin
5-Methyl-3-vinyl-2-oxazolidinone; VMOX
2,4,7,9-Tetramethyl-5-decyne-4,7-diol

Contact Us

Address: Shanyang Town, Jinshan District, Shanghai, 201508, China
Tel: +86 21 58330820;

Fax: +86 21 58330890
Email: sales@shuvtech.com

Follow us

Copyright(C)2025, Shanghai UVTECH Inc. All Rights Reserved. Supported by Toocle 31fabu Copyright Notice